- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 1/40 - Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate
Patent holdings for IPC class G03F 1/40
Total number of patents in this class: 54
10-year publication summary
|
3
|
1
|
4
|
3
|
7
|
9
|
4
|
4
|
4
|
2
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
9 |
| Hoya Corporation | 2822 |
6 |
| Boe Technology Group Co., Ltd. | 35384 |
4 |
| Agc, Inc. | 4029 |
3 |
| Samsung Display Co., Ltd. | 30585 |
2 |
| Yangtze Memory Technologies Co., Ltd. | 1940 |
2 |
| TCL China Star Optoelectronics Technology Co., Ltd. | 2368 |
2 |
| Kioxia Corporation | 9847 |
2 |
| Intel Corporation | 45621 |
1 |
| Micron Technology, Inc. | 24960 |
1 |
| Renesas Electronics Corporation | 6305 |
1 |
| Applied Materials Israel, Ltd. | 549 |
1 |
| Shin-Etsu Chemical Co., Ltd. | 5132 |
1 |
| LG Innotek Co., Ltd. | 6758 |
1 |
| Dai Nippon Printing Co., Ltd. | 3891 |
1 |
| Wistron Corporation | 2270 |
1 |
| Mitsubishi Chemical Corporation | 4313 |
1 |
| Advanced Mask Technology Center GmbH & Co. KG | 12 |
1 |
| Beijing BOE Display Technology Co., Ltd. | 2497 |
1 |
| Beijing BOE Optoelectronics Technology Co., Ltd. | 3779 |
1 |
| Other owners | 12 |